Objectives

Plan Apochromat Objectives

Extra And Ultra Long Working Distance 

PARFOCALITY ADJUSTABLE

PLAN APO ELWD PA

  • The unique Motic feature of parfocality adjustability assures smooth transitions between magnifications as a convenient time-saving function.

  • The infinity-corrected and strain-free optical system provides crisp and high-contrast images at the numerical apertures and working distance demanded

 

Plan Apochromat ELWD Objectives PA [Parfocality Adjustable]  

Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g)
ELWD 2X PA
0.055
34.0
100
5.0
91
Ø 12
2.4x3.2
3.3x4.4
270
ELWD 5X PA
 0.140
 34.0
 40
 2.0
 14
 Ø 4.8
 0.96x1.28
 1.32x1.76
 260
ELWD 10X PA
0.280
 33.5
 20
 1.0
 3.5
 Ø 2.4
 0.48x0.64
 0.66x0.88
 270
ELWD 20X PA
0.420
 20.0
 10
 0.7
 1.6
 Ø 1.2
 0.24x0.32
 0.33x0.44
 320

 

 

PLAN APO ELWD

  • The infinity-corrected and strain-free optical system provides crisp and high-contrast images at the numerical apertures and working distance demanded.

 

Plan Apochromat ELWD Objectives

Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g)
ELWD 2X
0.055
34.0
100
5.0
91
Ø12
2.4x3.2
3.3x4.4
250
ELWD 5X
0.140
34.0
40
2.0
14
Ø 4.8
0.96x1.28
1.32x1.76
240
ELWD 10X
0.280
33.5
20
1.0
3.5
Ø 2.4
0.48x0.64
0.66x0.88
250
ELWD 20X
0.420
20.0
10
0.7
1.6
Ø 1.2
0.24x0.32
0.33x0.44
300
ELWD 50X
0.550
13.0
4
0.5
0.9
Ø 0.48
0.192x0.256
0.264x0.352
320

  

HIGH NUMERICAL APERTURE

PLAN APO ELWD HNA

  • Constructed for optimum resolution and image clarity, the high numerical aperture extra long Plan Apochromat objective is ideal for applications requiring both working distance and a high numerical aperture.

  • The infinity-corrected and strain-free optical system provides crisp and high-contrast images at the working distance demanded.

 

 

Plan Apochromat ELWD Objectives HNA [High Numerical Aperture]

Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g)
ELWD 100X HNA
0.800
3.0
2.0
0.34
0.43
Ø 0.24
0.048X0.064
0.066X0.088
450

 

PLAN APO ULWD

  • Corrected within the 24mm field of view for all optical aberrations throughout the visible spectrum, the ultra-long Plan Apochromat objectives produce flat and true colour images with the extra amount of working distance demanded.

 

Plan Apochromat ULWD Objectives

Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g)
ULWD 50X
0.420
20.5
4
0.7
1.6
Ø 0.48
0.10X0.13
0.132X0.176
300
ULWD 100X
0.550
13.0
 2
0.5
0.9
Ø 0.24
0.05X0.06
0.066X0.088
340

 

PLAN NIR

  • The infinity-corrected and strain-free optical system provides crisp and high-contrast images at the numerical apertures and working distance demanded.

  • Designed to focus within the depth of focus, even when the laser wavelength used changes from the visible radiation (wavelength 532mm) to the near-infrared radiation range (wavelength 1064mm).

  • Fit a wide range of laser applications, such as laser-cutting fine-films of semiconductors and of liquid crystal substrates and much more.

 

 

Plan NIR Objectives

Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g)
NIR 20X
0.4
20.5
10
0.7
1.7
Ø 1.2
0.24X0.32
0.33X0.44
300
NIR 50X
0.42
19.0
4
0.65
1.6
Ø 0.48
0.096X0.128
0.132X0.176
320